I’ll be speaking at the Thin Film Society webinar on Dec 17! “Atomic Layer Innovations: New Pathways for Future Semiconductor Fabrication” • #ASDep for future patterning • AI-driven materials design via #ALDep 🕘 9 PM Seoul / 1 PM CET / 7 AM EST 🔗 voovmeeting.com/dm/xrmEzmbmY...

Our new paper in Applied Surface Science explores #ASDep of W and Ru using a Homometallic Precursor Inhibitor approach. Yes—we actively look for bad #ALDep precursors as inhibitors! Free to read/download until Jan 4th. authors.elsevier.com/a/1m6NhcXa-C...

I gave a seminar on the silicon chip industry and the importance of device fabrication at Incheon POSCO High School (인천포스코 고등학교). It’s always a great joy to meet highly motivated young students.

Today, I gave an invited seminar on ALD at Micron Technology’s TechTalk. It was a great opportunity to discuss challenging topics in semiconductor device fabrication. Boise is a nice city and a great home for Micron! #ALDep #ASDep

As you know, patterning technology has not traditionally played a central role. However, things have changed. Achieving nanoscale patterns with high reliability is now extremely challenging, and patterning is no longer just a supporting technique. pubs.acs.org/page/cmatex/...

This is a great community of chemists, physicists and engineers, academics and industry. Love it! #ASD2025 @asd2025leipzig.bsky.social

@cathleencrudden.bsky.social presenting the third tutorial at #ASD2025 introducing us to how crazy is it that ligands impart totally different properties to a metal. Also warning us to avoid Ni(CO)4

Group holiday season party!